SRAM with via displacement
US9390765B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 11, 2013 |
| Grant date | Jul 12, 2016 |
| Priority date | — |
| Expiry date | Mar 14, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The SRAM memory cell includes a metal wiring line having a titanium or tantalum film in a bottom layer, and a via having a tungsten plug. The via is arranged on the metal line following a layout rule which permits the misalignment. In arranging the upper-layer via with a tungsten plug on the metal line, one side of the via is disposed to be adjacent to one end of the metal line with a margin smaller than an alignment accuracy, and the lower-layer via is laid out far away from the end of the metal line as possible. The reduction in the yield, caused by the problem of the contact with the lower-layer via being broken or increased in resistance at occurrence of misalignment, can be suppressed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.