Low density ethylene-based polymers with high melt strength

US9394389B2 · kind B2 · utility

Assignee

• DOW GLOBAL TECHNOLOGIES LLC · US

Inventors

• Otto J. Berbee · Hulst, NL
• Cornelis F. J. Den Doelder · Terneuzen, NL
• Teresa P. Karjala · Lake Jackson, US
• Karl Zuercher · Samstagern, CH
• Jian Wang · Rosharon, US
• Stefan Hinrichs · Wondelgem, BE

Key dates

• Filing date: Mar 12, 2013
• Grant date: Jul 19, 2016
• Expiry date: Mar 12, 2033

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C08L2207/066
• WIPO field: Macromolecular chemistry, polymers
• WIPO sector: Chemistry

Abstract

The invention provides a composition comprising a first ethylene-based polymer, formed by a high pressure, free-radical polymerization process, and comprising the following properties: a) a Mw(abs) versus I2 relationship: Mw(abs)<A×[(I2)B], where A=5.00×102 (kg/mole)/(dg/min)B, and B=−0.40; and b) a MS versus I2 relationship: MS≧C×[(I2)D], where C=13.5 cN/(dg/min)D, and D=−0.55.