Process for manufacturing glazing comprising a porous layer
US9394602B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 15, 2012 |
| Grant date | Jul 19, 2016 |
| Priority date | — |
| Expiry date | Aug 10, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24997
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for manufacturing glazing including a substrate provided with a coating including a layer consisting of a porous material, includes depositing on the substrate, via a physical vapor deposition (PVD) process in a vacuum chamber, a coating including a layer of a material including an element selected from Si, Ti, Sn, Al, Zr, In or a mixture of at least two of these elements, oxygen and carbon, the layer in addition optionally including hydrogen, heat treatment of the layer thus deposited, under conditions that enable at least one portion of the carbon to be removed and the layer of porous material to be obtained, wherein the deposition is carried out, on the substrate passing through the chamber, by the sputtering of a carbon target, under a reactive plasma atmosphere including a precursor of the element or elements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.