Vapor deposition system and method
US9394605B1 · kind B1 · utility
4Cited by
12References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 23, 2014 |
| Grant date | Jul 19, 2016 |
| Priority date | — |
| Expiry date | Sep 9, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/568
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A deposition system includes a system housing having a housing interior, a fixture transfer assembly having a generally sloped fixture transfer rail extending through the housing interior, a plurality of processing chambers connected by the fixture transfer rail, a controller interfacing with the processing chambers and at least one fixture carrier assembly carried by the fixture transfer rail and adapted to contain at least one substrate. The fixture carrier assembly travels along the fixture transfer rail under influence of gravity. A deposition method is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.