Phase shift mask, patterning method using the same and method of manufacturing display panel using the same
US9395619B2 · kind B2 · utility
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2References
20Claims
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Key dates
| Filing date | Jun 18, 2014 |
| Grant date | Jul 19, 2016 |
| Priority date | — |
| Expiry date | Oct 3, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/0231
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A phase shift device includes a phase shift mask which includes a transparent substrate, and a phase shift pattern which is provided on the transparent substrate, and includes a first area having a first thickness, a second area having a second thickness which is less than the first thickness, a first opening having a first opening width and defined at the first area, and a second opening having a second opening width and defined at the second area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.