In-situ monitoring of fabrication of integrated computational elements
US9395721B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 24, 2013 |
| Grant date | Jul 19, 2016 |
| Priority date | — |
| Expiry date | Dec 24, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B2219/32368
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Techniques include receiving a design of an integrated computational element (ICE), the ICE design including specification of a substrate and a plurality of layers, their respective target thicknesses and complex refractive indices, complex refractive indices of adjacent layers being different from each other, and a notional ICE fabricated in accordance with the ICE design being related to a characteristic of a sample; forming at least some of the plurality of layers of the ICE in accordance with the ICE design; performing at least two different types of in-situ measurements; predicting, using results of the at least two different types of in situ measurements, performance of the ICE relative to the ICE design; and adjusting the forming of the layers remaining to be formed, at least in part, by updating the ICE design based on the predicted performance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.