Patent · US Active

Resistor and method of manufacture

US9396849B1 · kind B1 · utility

19Cited by
15References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 10, 2014
Grant dateJul 19, 2016
Priority date
Expiry dateMar 13, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01C17/281
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

The present technology is directed toward a resistor and method of manufacturing the resistor. One or more layers of insulative material are formed on a length of resistive material. Portions of the one or more layers insulative material are removed from the resistive material in a pattern based on a predetermined approximate dimension and predetermined approximate resistance value. A first set of one or more conductive layers are formed on the portions of the resistive material exposed by the insulative coating to form a plurality of conductive pads on the resistive material between the patterned insulative material. The sets of conductive pads are probed to measure a preliminary resistance value between the sets of conductive pads. For one or more sets of conductive pads, a calculated amount of additional insulative material adjacent the respective conductive pads is removed based upon the preliminary resistance value between the corresponding set of conductive pads and a final resistance value to exposed additional portions of resistive material. The conductive pads and resistive material is cut at substantially the middle of each conductive pad to form pieces. A second set of o…

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.