Patent · US Active

Method of producing an optoelectronic semiconductor chip

US9397280B2 · kind B2 · utility

1Cited by

0References

19Claims

0Family size

Assignee

OSRAM Opto Semiconductors GmbH · DE

Inventors

Britta Göötz · Regensburg, DE
Jürgen Moosburger · Regensburg, DE
Andreas Plößl · Regensburg, DE
Matthias Sabathil · Regensburg, DE

Key dates

Filing date	Feb 14, 2013
Grant date	Jul 19, 2016
Priority date	—
Expiry date	Feb 14, 2033

Classification

Technology area (CPC H)Electricity
CPC primaryH10H20/0365
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A method of producing an optoelectronic semiconductor chip includes growing an optoelectronic semiconductor layer sequence on a growth substrate, forming an electrically insulating layer on a side of the optoelectronic semiconductor layer sequence facing away from the growth substrate by depositing particles of an electrically insulating material by an aerosol deposition method, and at least partly removing the growth substrate after forming the electrically insulating layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.