Optical patterning mask and method of fabricating display device using the same
US9397297B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 13, 2015 |
| Grant date | Jul 19, 2016 |
| Priority date | — |
| Expiry date | Feb 19, 2035 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41M5/48
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
An optical patterning mask, including a base substrate, a reflective layer disposed on the base substrate, the reflective layer including a first opening, a shadow pattern disposed on the base substrate and in the first opening, a thermal insulation layer disposed on the base substrate and covering the reflective layer and the shadow pattern, an absorption layer disposed on the thermal insulation layer, a bank layer disposed on the absorption layer, the bank layer including a second opening overlapping the first opening, a thermal conduction prevention pattern disposed on the absorption layer and overlapping the shadow pattern, and a transfer layer disposed on the absorption layer, the bank layer, and the thermal conduction prevention pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.