Patent · US Active

Method and device for forming a plasma beam

US9398678B2 · kind B2 · utility

0Cited by
3References
20Claims
0Family size

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Key dates

Filing dateSep 14, 2011
Grant dateJul 19, 2016
Priority date
Expiry dateMay 21, 2032

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05H1/54
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

The invention relates to a method and device for forming a plasma beam. According to the invention: the quality of the electroneutrality of the plasma beam (PB) is detected (in 12 and/or 13); and the alternating polarization potentials of the extraction and acceleration grid (4) are adjusted such that the plasma beam (PB) is at least approximately electrically neutral.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.