Method for carbonitriding at least one component in a treatment chamber
US9399811B2 · kind B2 · utility
1Cited by
2References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 3, 2011 |
| Grant date | Jul 26, 2016 |
| Priority date | — |
| Expiry date | Mar 7, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C8/34
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention relates to a method for carbonitriding at least one component (12) in a treatment chamber (16), in which at least one process gas (28; 30) is introduced into the treatment chamber (16), wherein a hydrogen content (44) is detected in an atmosphere developing in the treatment chamber (16) and is maintained in a desired range (55; 57) at least at intervals by influencing of the amount of the process gas (28; 30) that is fed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.