Solvent-free, self-polishing polyurethane matrix for use in solvent-free antifoulings
US9404018B2 · kind B2 · utility
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11Claims
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Key dates
| Filing date | Oct 20, 2015 |
| Grant date | Aug 2, 2016 |
| Priority date | — |
| Expiry date | Oct 20, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08K5/0058
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A polyol having the formula Si(O—R1—OH)m(O—R2)nR3. Each R1 is a divalent radical derived from diethylene glycol, triethylene glycol, dipropylene glycol, or tripropylene glycol, each R2 is an aliphatic group, and R3 is an alkyl group or aromatic group. The value m is 2 or 3 and n is 0 or 1. A process of making the above polyol by: providing a reactant having the formula Si(O—R2)3R3, and reacting the reactant with a diol having the formula HO—R1—OH. An antifouling coating comprising a thermoset formed by reacting a polyisocyanate with the above polyol. The coating is not a foam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.