Patent · US Active

Determination of metal and metalloid concentrations using ICPMS

US9406490B1 · kind B1 · utility

7Cited by
1References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 4, 2015
Grant dateAug 2, 2016
Priority date
Expiry dateMay 4, 2035

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB05B14/45
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A system for determining an analyte by inductively coupled plasma mass spectrometry (ICPMS) includes a sample introduction device having a heated cyclonic spray chamber. The system is configured to introduce sample that includes a metal and/or a metalloid having an organic interferent. The system also includes an inductively coupled plasma mass spectrometry device with a collision/reaction cell configured to receive a mixture of gases including both ammonia and hydrogen. A method includes introducing a sample to plasma to produce a characteristic spectrum associated with an elemental composition of the sample. The method also includes introducing both ammonia and hydrogen to a collision/reaction cell to remove carbon-based interferences to detection of the sample prior to determining the elemental composition of the sample.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.