Patent · US Active

Aromatic polyacetals and articles comprising them

US9410016B2 · kind B2 · utility

0Cited by
39References
10Claims
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Key dates

Filing dateJul 16, 2013
Grant dateAug 9, 2016
Priority date
Expiry dateJan 15, 2034

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08G2650/12
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

A polymer includes repeat units having the structurewherein R1, R2, Ar1, Ar2, and Ar3 are defined herein. The polymer can be prepared by Suzuki polycondensation. The acetal and/or ketal functionality in the polymer backbone make the backbone-cleavable in acid. The polymer is useful in applications including lithographic photoresists.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.