Microwave plasma reactor for manufacturing synthetic diamond material
US9410242B2 · kind B2 · utility
0Cited by
34References
19Claims
0Family size
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Key dates
| Filing date | Dec 14, 2011 |
| Grant date | Aug 9, 2016 |
| Priority date | — |
| Expiry date | Mar 15, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/339
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.