Patent · US Active

Support stage

US9411233B2 · kind B2 · utility

2Cited by
5References
20Claims
0Family size

Assignees

Inventors

Key dates

Filing dateJul 29, 2014
Grant dateAug 9, 2016
Priority date
Expiry dateNov 11, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/68742
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A support stage comprises a body; at least one pin hole disposed in the body; a lift pin which is received in the pin hole and movable upwards or downwards; at least one groove disposed on a hole wall of the pin hole; and balls which are accommodated in the groove and capable of freely rolling in the groove, wherein the groove is disposed around the lift pin, and is shaped and sized such that each ball is capable of rolling in the groove and a part of each ball projects beyond the hole wall of the pin hole even when the each ball is pressed by the lift pin. With the support stage according to the embodiment of the present invention, the balls are disposed in the groove of the pin hole. In this way, generation of the particles can be alleviated.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.