Hybrid waveguide lasers and methods for fabricating hybrid waveguide lasers

US9413139B2 · kind B2 · utility

Assignees

• IMEC VZW · BE
• UNIVERSITEIT GENT · BE

Inventors

• Dries Van Thourhout · Evergem, BE
• Zhechao Wang · Tournai, BE
• Joris Van Campenhout · Brussels, BE
• Maria Ioanna Pantouvaki · Kessel-Lo, BE

Key dates

• Filing date: Jul 1, 2014
• Grant date: Aug 9, 2016
• Expiry date: Sep 15, 2034

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01S2301/176
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The present disclosure relates to a method for integrating a sub-micron III-V waveguide laser on a semiconductor photonics platform as well as to a corresponding device/system. The method comprises providing on a semiconductor substrate an electrically insulating layer, etching a trench having a width in the range between 50 nm and 800 nm through the electrically insulating layer, thereby locally exposing the silicon substrate, providing a III-V layer stack in the trench by local epitaxial growth to form a channel waveguide, and providing a light confinement element for confining radiation in the local-epitaxial-grown channel waveguide.