Resin composition for optical stereolithography
US9416220B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 16, 2013 |
| Grant date | Aug 16, 2016 |
| Priority date | — |
| Expiry date | May 16, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/038
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A resin composition for optical stereolithography including a cation-polymerizable organic compound (A), a radical polymerizable organic compound (B), a cationic polymerization initiator (C) and a radical polymerization initiator (D), wherein the cationic polymerization initiator (C) is an aromatic sulfonium compound (C-1) represented by the following general formula (C-1):wherein R1, R2, and R3 represent a monovalent organic group, Rf represents a fluoroalkyl group, m is the same number as the cationic charge of the “cation [S+(R1)(R2)(R3)]”, and n is an integer in a range of 0 to 6. The resin composition also includes an aromatic thiol compound (E) represented by the following general formula (E):R4SH)p (E)wherein, R4 represents a mono- or di-valent aromatic hydrocarbon which may optionally have a substituent, and p is an integer of 1 or 2.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.