Exposure apparatus and exposure system
US9417536B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jul 24, 2014 |
| Grant date | Aug 16, 2016 |
| Priority date | — |
| Expiry date | Jan 30, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70791
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus is provided. It comprises: a substrate stage on which a holding region is provided to hold a substrate to be exposed, the holding region being provided with a support portion thereon for supporting the substrate to be exposed; a supporter configured to support a mask; a light source system configured to provide an exposure light which is illuminated on the substrate to be exposed via the mask to reproduce a pattern of the mask onto the substrate, wherein the support portion has a height which decreases gradually from an outer periphery of the holding region to a center of the holding region, such that an exposure distance is constant at all of positions on the holding region. With the above structure, the graph dimension may be kept uniform on the substrate even if the mask becomes bent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.