Patent · US Active

Method for producing a microscreen

US9421500B2 · kind B2 · utility

1Cited by

2References

8Claims

0Family size

Assignee

Siemens Aktiengesellschaft · DE

Inventors

Susanne Kornely · Munich, DE
Markus Schieber · Munich, DE
Daniel Sickert · Nuremberg, DE

Key dates

Filing date	Feb 17, 2014
Grant date	Aug 23, 2016
Priority date	—
Expiry date	Feb 17, 2034

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB01D2325/02
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A method produces a microscreen by providing a support and applying a photoresist layer with a definable thickness to the support. The photoresist is exposed by radiation using a mask that defines the structure of the microscreen. The photoresist is then developed. The thickness of the photoresist layer is selected such that, in a sub-region of the photoresist layer, the radiation used for the exposure penetrates only so slightly that practically no cross-linking of the photoresist takes place.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.