In situ cleaning system
US9421586B2 · kind B2 · utility
1Cited by
37References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 6, 2013 |
| Grant date | Aug 23, 2016 |
| Priority date | — |
| Expiry date | Nov 10, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC02F2201/4618
- WIPO fieldEnvironmental technology
- WIPO sectorChemistry
Abstract
In situ cleaning systems and methods of use are disclosed and provide cleaning use solutions with minimal chemical additives providing environmentally-friendly cleaning compositions. The in situ cleaning system provides one or more in situ cleaning components, including water treatment components, oxidizing agent generating component and/or alkalinity generating component, providing a cleaning use solution to a washing system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.