Patent · US Active

Method for producing a solar cell

US9425333B2 · kind B2 · utility

0Cited by
3References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 25, 2011
Grant dateAug 23, 2016
Priority date
Expiry dateMar 14, 2033

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02E10/50
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A device including a surface layer of a selected material in a predetermined pattern on a substrate surface. A groove or ridge arranged in the substrate surface includes a bottom or top face, respectively, and at least one side face sloping relative to the bottom or top face. The surface layer is deposited on a part of the substrate including the groove or ridge by vacuum chamber sputtering the selected material from a sputtering source while moving the substrate past the sputtering source in a direction substantially perpendicular to a sputtering main lobe direction and with a normal to the substrate surface substantially in a predefined angle with the main lobe direction. By uniformly etching away surface layer material deposited on the substrate by the sputtering until freeing a substantial part of the side face, the predetermined pattern becomes defined substantially by the bottom face or the top face.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.