System and method of determining effective glow discharge lamp current
US9426873B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 28, 2013 |
| Grant date | Aug 23, 2016 |
| Priority date | — |
| Expiry date | May 22, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/0081
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The embodiments of the invention include a method for controlling plasma conditions of a glow discharge system using the integrated electron (or ion) pulse area extracted from the total lamp current. The method of using an integrated electron/ion pulse area for controlling plasma conditions allows for controlled analysis of conductive, non-conductive and layered materials without the need for estimation of plasma voltages. The method allows for control of sputter rates and plasma emissions that cannot be achieved using other methods such as capacitive divider calculations where actual thicknesses and dielectric constants are not known or predefined.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.