Method of patterning self-organizing material, patterned substrate of self-organizing material and method of producing the same, and photomask using patterned substrate of self-organizing material
US9429845B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 20, 2013 |
| Grant date | Aug 30, 2016 |
| Priority date | — |
| Expiry date | Aug 2, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24802
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for performing micro fabrication includes using, as a photomask, a self-organizing material-patterned substrate which is soluble in an organic solvent. A method for emitting light includes emitting the light in a pattern of a nucleic acid which is a self-organizing material immobilized on a self-organizing material-patterned substrate. An immobilization layer containing a binding material capable of binding to a self-organizing material is formed on a substrate. Then this immobilization layer is patterned by transferring a protrusion and recess pattern formed in a mold thereto by the imprint process. The self-organizing material is supplied onto the side having the protrusion and recess pattern of the immobilization layer transferred thereto. Thus, the self-organizing material is immobilized according to the protrusion and recess pattern of the immobilization layer owning to the self-organizing ability of the material per se and the binding ability of the binding material contained in the immobilization layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.