Patent · US Active

Method for reducing direct hit artifacts and x-ray facility

US9430826B2 · kind B2 · utility

1Cited by

3References

21Claims

0Family size

Assignee

Siemens Aktiengesellschaft · DE

Inventor

Boris Stowasser · Erlangen, DE

Key dates

Filing date	Mar 27, 2013
Grant date	Aug 30, 2016
Priority date	—
Expiry date	Jul 25, 2033

Classification

Technology area (CPC G)Physics
CPC primaryG06T2207/20016
WIPO fieldComputer technology
WIPO sectorElectrical engineering

Abstract

A method for reducing artifacts produced by x-ray radiation directly striking a measuring pixel of a CMOS detector after crossing a scintillator, wherein, for an x-ray image recorded using the CMOS detector, artifact image points are extracted by applying a local, edge-obtaining smoothing operator that evaluates image data of neighboring image points located in the vicinity of a considered image point and comparison with the image to which the smoothing operator was applied, and their image data is corrected.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.