Electrostatic discharge protection
US9431387B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 10, 2015 |
| Grant date | Aug 30, 2016 |
| Priority date | — |
| Expiry date | Nov 10, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D89/921
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A device comprising an electrostatic discharge protection structure, an ion sensitive field effect transistor (ISFET) having a floating gate, and a sensing layer located above the floating gate. The device is configured such that the electrical impedance from the sensing layer to the electrostatic discharge protection structure is less than the electrical impedance from the sensing layer to the floating gate. The device can be fabricated in a standard CMOS process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.