Patent · US Active

Method for removal of residual monomers from water-absorbing polymer particles

US9434802B2 · kind B2 · utility

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15Claims
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Key dates

Filing dateJan 20, 2014
Grant dateSep 6, 2016
Priority date
Expiry dateJan 20, 2034

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08L2312/00
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

A process for removing residual monomers from water-absorbing polymer particles by thermally aftertreating the water-absorbing polymer particles in a mixer with rotating mixing tools at a temperature of at least 60° C. in the presence of water and of a surfactant.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.