Exposure machine
US9436100B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Nov 22, 2013 |
| Grant date | Sep 6, 2016 |
| Priority date | — |
| Expiry date | May 8, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2008
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is exposure machine, comprising: a loading frame, for placing an object to be exposed; a light source device, located at one side of a plane where the loading frame is positioned, wherein the light emitting direction of the light source device is perpendicular to a plane where the object to be exposed is positioned. During exposure, the loading frame will not reflect the light transmitting through the object to be exposed, and thus the stage spots are avoided. Further, when the exposure machine is operated in a vertical manner, a bidirectional exposure may be achieved only by adding a single prism into the light source device in the prior art, and thus the exposure efficiency is greatly improved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.