Oxidation process for interconnects and end plates
US9437879B1 · kind B1 · utility
2Cited by
1References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 19, 2013 |
| Grant date | Sep 6, 2016 |
| Priority date | — |
| Expiry date | Jul 2, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E60/50
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Methods and systems for oxidizing an interconnect for a fuel cell stack include introducing at least one interconnect to an oxidizing gas containing water vapor, the oxidizing gas being at least substantially free of nitrogen, and oxidizing the at least one interconnect in the presence of the oxidizing gas at an elevated temperature. The oxidation may be performed at a sub-atmospheric pressure. The oxidation of the interconnect may be a controlled oxidation that is performed prior to incorporating the interconnect into a fuel cell stack.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.