Electron sensitive glass and optical circuits, microstructures formed therein
US9440876B2 · kind B2 · utility
0Cited by
0References
13Claims
0Family size
Inventors
Key dates
| Filing date | May 29, 2014 |
| Grant date | Sep 13, 2016 |
| Priority date | — |
| Expiry date | Jul 29, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24355
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
An electron definable glass or an electron sensitive glass for microstructures is provided with microstructures and optical waveguides formed therein. The microstructures are formed by electron beam irradiation in selected areas in the electron definable glass followed by a high temperature heat treatment and chemical etching, whereas the optical waveguides are formed by irradiating the electron definable glass by an electron beam followed by a low temperature heat treatment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.