Patent · US Active

Block copolymer comprising polyorganosiloxane block and polyolefin block

US9441079B2 · kind B2 · utility

13Cited by

29References

17Claims

0Family size

Inventors

Yu Yang · Eden Prairie, US
Shilpi K. Sanghi · Windom, US
Suresh S. Iyer · Woodbury, US
Yongshang Lu · Woodbury, US

Key dates

Filing date	Nov 19, 2013
Grant date	Sep 13, 2016
Priority date	—
Expiry date	Nov 19, 2033

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC09D183/06
WIPO fieldMacromolecular chemistry, polymers
WIPO sectorChemistry

Abstract

Presently described are block copolymers suitable for use as a low adhesion backsize (“LAB”) coating. The block copolymers comprise at least one polyorganosiloxane block and at least one polyolefin block. The polyolefin block is semi-crystalline having a melt point of at least 110° C. The block copolymer typically has the structure: A[-L-B]n wherein A is a polyorganosiloxane block and B is a polyolefin block. L is a covalent bond or a divalent linking group. In some embodiments, L is the reaction product of an amine or hydroxyl and an anhydride.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.