Lithographic offset inks with water and filler content

US9441120B2 · kind B2 · utility

Assignee

• Sun Chemical Corporation · US

Inventors

• Reiner Jung · Aschaffenburg, DE
• Jochen GATTERMAYER · Ludwigshafen am Rhein, DE
• Kai-Uwe Gaudl · Wantage, US
• Ramasamy Krishnan · Colonia, US
• Lars Keller · Aiterhofen, DE
• Cumhur Bilgic · İstanbul, TR
• Jeff Jones · Chicago, US
• Jeff Newton · Oswego, US
• Adelbert Dettling · Goldbach, DE
• Russell Schwartz · Parsippany, US

Key dates

• Filing date: Jun 14, 2013
• Grant date: Sep 13, 2016
• Expiry date: Jun 14, 2033

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/24901
• WIPO field: Basic materials chemistry
• WIPO sector: Chemistry

Abstract

Lithographic printing inks are described, which are characterized by the inclusion of both water, in a substantially emulsified form, and inorganic filler. Inks of the present invention show improved printing properties in offset lithography, including improved transfer, reduced piling and improved mileage. They also offer cost advantages over currently available inks and the ability to minimize or eliminate entirely mineral oil from their compositions. The inks of the present invention may be used in both web-based print processes including coldset and heatset, as well as in sheetfed printing. The inks may be dried to a durable ink film at ambient temperature, with thermal energy or with actinic or electron beam radiation, or with any combination thereof.