Sub-wavelength extreme ultraviolet metal transmission grating and manufacturing method thereof

US9442230B2 · kind B2 · utility

Assignee

• INSTITUTE OF MICROELECTRONICS OF THE CHINESE ACADEMY OF SCIENCES · CN

Inventors

• Hailiang Li · Beijing, CN
• Changqing Xie · Beijing, CN
• Ming Liu · Beijing, CN
• Dongmei Li · Beijing, CN
• Lina Shi · Beijing, CN
• Xiaoli Zhu · Beijing, CN

Key dates

• Filing date: Dec 30, 2013
• Grant date: Sep 13, 2016
• Expiry date: Mar 21, 2035

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/40
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A method of manufacturing a sub-wavelength extreme ultraviolet metal transmission grating is disclosed. In one aspect, the method comprises forming a silicon nitride self-supporting film window on a back surface of a silicon-based substrate having both surfaces polished, then spin-coating a silicon nitride film on a front surface of the substrate with an electron beam resist HSQ. Then, performing electron beam direct writing exposure on the HSQ, developing and fixing to form a plurality of grating line patterns and a ring pattern surrounding the grating line patterns. Then depositing a chrome material on the front surface of the substrate through magnetron sputtering. Then, removing the chrome material inside the ring pattern. Then, growing a gold material on the front surface of the substrate through atomic layer deposition. Lastly, removing the gold material on the chrome material outside the ring pattern as well as on and between the grating line patterns, thereby only retaining the gold material on sidewalls of the grating line patterns.