Patent · US Active

Method for producing a microscreen

US9442379B2 · kind B2 · utility

0Cited by

4References

2Claims

0Family size

Assignee

Siemens Aktiengesellschaft · DE

Inventors

Susanne Kornely · Munich, DE
Markus Schieber · Munich, DE
Daniel Sickert · Nuremberg, DE

Key dates

Filing date	Feb 17, 2014
Grant date	Sep 13, 2016
Priority date	—
Expiry date	Feb 17, 2034

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB01D2325/02
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A microscreen, substantially formed of a photoresist material, is produced by applying a photoresist layer to a support using a liquid photoresist, partially covering the photoresist layer with a mask that defines the structure of the microscreen, exposing the photoresist to radiation, developing the photoresist, and removing the photoresist from the support.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.