Patent · US Active

Method for manufacturing ESD device, ESD device and display panel

US9443884B2 · kind B2 · utility

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3References
15Claims
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Key dates

Filing dateSep 25, 2013
Grant dateSep 13, 2016
Priority date
Expiry dateOct 20, 2033

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/0002
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

There is disclosed a method for manufacturing an Electro Static Discharge (ESD) device, an ESD device and a display panel, which are capable of addressing an issue that static-electric charges accumulated on the array substrate damage the unformed ESD device and improving a yield ratio of the array substrate. The method includes forming a TFT, a first lead wire, wherein the first lead wire or the second lead wire comprises at least two separate lead-wire segments; depositing a layer of passivation thin film, and forming via-holes for connecting the at least two separate lead-wire segments on the layer of passivation thin film; depositing a layer of transparent conductive film on the substrate on which the via-holes are formed, wherein the layer of transparent conductive film connects the lead-wire segments by the via-holes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.