Patent · US Active

SOI substrate, physical quantity sensor, SOI substrate manufacturing method, and physical quantity sensor manufacturing method

US9446938B2 · kind B2 · utility

1Cited by
3References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 24, 2014
Grant dateSep 20, 2016
Priority date
Expiry dateApr 24, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D48/50
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A capacitance type physical quantity sensor includes: a first substrate; and a second substrate bonded to the first substrate through an insulating film. The second substrate includes first and second groove portions at a place of the second substrate facing an end portion of the first and second support units formed on the first substrate on a side opposite to the movable unit. A part of the end portion of the first support unit protrudes over the first groove portion. A part of the end portion of the second support unit protrudes over the second groove portion.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.