Thermal marking systems and methods of control
US9448039B2 · kind B2 · utility
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10Claims
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Key dates
| Filing date | Sep 23, 2015 |
| Grant date | Sep 20, 2016 |
| Priority date | — |
| Expiry date | Sep 23, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05B47/10
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A target marking system includes a light source emitting a thermal beam and an optics assembly directing the thermal beam to impact a target, the target directing radiation to the optics assembly in response to the impact. The target marking system further includes a detector, and an optics assembly optically connected to the detector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.