Patent · US Active

Cleaning apparatus for cleaning articles

US9452099B2 · kind B2 · utility

3Cited by

3References

22Claims

0Family size

Assignee

MEIKO Maschinenbau GmbH & Co. KG · DE

Inventors

Vera Schneider · Offenburg, DE
Thomas Näger · Offenburg, DE
Thomas Peukert · Laufenburg (Baden), DE
Hans-Josef Rauber · Oberharmersbach, DE
Ingo Gerhard Wiegand · Frebershausen, DE

Key dates

Filing date	Aug 6, 2013
Grant date	Sep 27, 2016
Priority date	—
Expiry date	Sep 7, 2034

Classification

Technology area (CPC A)Human Necessities
CPC primaryA61L2202/17
WIPO fieldFurniture, games
WIPO sectorOther fields

Abstract

A cleaning apparatus for cleaning articles is proposed. The cleaning apparatus comprises at least one cleaning chamber for receiving the articles. The cleaning apparatus comprises, in the cleaning chamber, at least one fluid source for subjecting the articles to the action of at least one cleaning fluid. The cleaning apparatus furthermore comprises at least one plasma source, which is designed to ignite at least one plasma in at least one gas and to generate at least one reactive gas. The cleaning apparatus is designed to bring the reactive gas into contact with the articles, at least in part.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.