Patent · US Active

Continuous substrate treatment plant and cleaning method

US9452456B2 · kind B2 · utility

0Cited by

1References

4Claims

0Family size

Assignee

VON ARDENNE GMBH · DE

Inventors

Hubertus Von Der Waydbrink · Dresden, DE
Steffen Grosser · Dresden, DE
Michael Hentschel · Dresden, DE
Daniel Stange · Dresden, DE
Thomas Meyer · Dresden, DE

Key dates

Filing date	Sep 16, 2013
Grant date	Sep 27, 2016
Priority date	—
Expiry date	Oct 31, 2034

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C14/564
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A substrate treatment plant includes a process chamber delimited by chamber walls and in the process chamber a substrate conveying unit for the horizontal conveyance of slab-shaped substrates in one conveying plane and in one conveying direction. The substrate conveying unit includes an arrangement of rotatably mounted, cylindrical conveying rollers transversely arranged to the conveying direction, the topmost generatrices of the conveying rollers defining the conveying plane, and at least one substrate treatment unit, which is located above the conveying plane, and at least one gas inlet. In the region of the substrate treatment unit at least one additional heating unit is located below the conveying plane and a condensation unit is located under the substrate conveying unit.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.