Method and device for producing a low-emissivity layer system
US9453334B2 · kind B2 · utility
3Cited by
2References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 20, 2012 |
| Grant date | Sep 27, 2016 |
| Priority date | — |
| Expiry date | Jan 26, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/32
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method for producing a low-emissivity layer system includes the steps of forming at least one low emissivity layer on at least one side of the substrate by deposition, and subsequent brief tempering of a deposited low emissivity layer by electromagnetic radiation, avoiding an immediate heating up of the substrate. A device for performing the method includes a flash lamp arrangement.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.