Photonic structures from self assembly of brush block copolymers and polymer blends
US9453943B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 28, 2013 |
| Grant date | Sep 27, 2016 |
| Priority date | — |
| Expiry date | Jan 12, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2202/32
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The invention provides a class of block copolymers having a plurality of chemically different blocks, at least a portion of which incorporating polymer side chain groups having a helical secondary structure. The invention also provides structures generated by self-assembly of polymer blends including at least one block copolymer component, such as a brush block polymer or wedge-type block polymer. The invention provides, for example, periodic nanostructures and microstructures generated by self-assembly of block copolymers and polymer blends comprising a mixture of at least one block copolymer component, such as a brush block copolymer, and at least a second component.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.