Thin-film devices and fabrication
US9454053B2 · kind B2 · utility
69Cited by
184References
44Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 10, 2012 |
| Grant date | Sep 27, 2016 |
| Priority date | — |
| Expiry date | Dec 10, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49126
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.