Method for producing a solar cell

US9461195B2 · kind B2 · utility

Assignee

• Fraunhofer-Gesellschaft zur förderung der angewandten Forschung e.V. · DE

Inventors

• Jens Dirk Moschner · Tarp, DE
• Henning Nagel · Untergruppenbach, DE
• Agata Lachowicz · Erkrath, DE
• Markus Fiedler · Bodenwerder, DE

Key dates

• Filing date: Feb 22, 2013
• Grant date: Oct 4, 2016
• Expiry date: Feb 22, 2033

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y02P70/50

Abstract

The invention relates to a method for producing a solar cell having a substrate made of silicon, which substrate has a silicon oxide layer present on the surface of the substrate and an antireflection layer applied to the silicon oxide layer, which antireflection layer is deposited onto the dielectric passivation layer in a process chamber. According to the invention, in order to achieve a stability of corresponding solar cells or solar cell modules produced therefrom against a potential induced degradation (PID), the dielectric passivation layer is formed from the surface of the substrate in the process chamber by means of a plasma containing an oxidizing gas.