Patent · US Active

Manufacturing method for a piezoelectric layer arrangement and corresponding piezoelectric layer arrangement

US9461234B2 · kind B2 · utility

0Cited by
2References
15Claims
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Assignee

Inventors

Key dates

Filing dateJul 30, 2015
Grant dateOct 4, 2016
Priority date
Expiry dateJul 30, 2035

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10N30/883

Abstract

A manufacturing method is provided for a piezoelectric layer arrangement and a corresponding piezoelectric layer arrangement. The manufacturing method includes the steps: depositing a first electrode layer on a substrate; depositing a first insulating layer on the first electrode layer; forming a through opening in the first insulating layer to expose the first electrode layer within the through opening; depositing a piezoelectric layer on the first insulating layer and on the first electrode layer within the through opening; back-polishing the resulting structure to form a planar surface, on which a piezoelectric layer area, surrounded by the first insulating layer, is exposed; and depositing and structuring a second electrode layer on the first insulating layer, which contacts the piezoelectric layer area.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.