Method and apparatus for generating featured scan pattern
US9465071B2 · kind B2 · utility
1Cited by
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22Claims
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Key dates
| Filing date | Mar 3, 2015 |
| Grant date | Oct 11, 2016 |
| Priority date | — |
| Expiry date | Apr 10, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11C2029/1202
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
An method of generating a featured scan pattern for scan test includes: providing a plurality of predetermined scan patterns to perform scan test on a plurality of devices under test (DUT) under a stress condition to generate a plurality of test responses of each DUT; grouping a plurality of specific test responses of each DUT from the test responses of each DUT to determine a feature value corresponding to a failure feature for each DUT; and generating at least one featured scan pattern according to the feature value of each DUT.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.