Nanopatterning method and apparatus
US9465296B2 · kind B2 · utility
14Cited by
12References
26Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 11, 2012 |
| Grant date | Oct 11, 2016 |
| Priority date | — |
| Expiry date | Jul 15, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2014
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a movable nanostructured film is used to image a radiation-sensitive material. The nanopatterning technique makes use of Near-Field photolithography, where the nanostructured film used to modulate light intensity reaching radiation-sensitive layer. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a movable film comprises metal nano holes or nanoparticles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.