Patterned growth guiding mechanism
US9466325B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Jun 18, 2014 |
| Grant date | Oct 11, 2016 |
| Priority date | — |
| Expiry date | Jan 13, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/855
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Provided herein are apparatuses and methods related to creating a patterned resist layer on a substrate; selectively treating at least a resist-contacting layer of the substrate in contact with the patterned resist layer to create a patterned growth guiding mechanism and growing patterned magnetic features guided by the patterned growth guiding mechanism.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.