Patent · US Active

Device for cleaning fixed abrasives polishing pad

US9475170B2 · kind B2 · utility

0Cited by
4References
10Claims
0Family size

Assignee

Inventor

Key dates

Filing dateNov 20, 2014
Grant dateOct 25, 2016
Priority date
Expiry dateNov 20, 2034

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB24B37/245
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

A device for cleaning a fixed abrasive polishing pad includes a main body having a surface facing the polishing pad, an inlet coupled to an end of the main body and configured to supply a cleaning liquid, an inject orifice coupled to the inlet for injecting the cleaning liquid and being provided on the surface of the main body, an outlet coupled to the end of the main body, and a recycle orifice coupled to the outlet, and being provided on the surface of the main body.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.