Sulfonic acid derivative compounds as photoacid generators in resist applications
US9477150B2 · kind B2 · utility
3Cited by
18References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 13, 2015 |
| Grant date | Oct 25, 2016 |
| Priority date | — |
| Expiry date | Mar 13, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/38
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Novel photoacid generator compounds are provided. Photoresist compositions that include the novel photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.