Methods for fabricating refined graphite-based structures and devices made therefrom
US9478422B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 25, 2014 |
| Grant date | Oct 25, 2016 |
| Priority date | — |
| Expiry date | Feb 25, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24851
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Graphite-based devices with a reduced characteristic dimension and methods for forming such devices are provided. One or more thin films are deposited onto a substrate and undesired portions of the deposited thin film or thin films are removed to produce processed elements with reduced characteristic dimensions. Graphene layers are generated on selected processed elements or exposed portions of the substrate after removal of the processed elements. Multiple sets of graphene layers can be generated, each with a different physical characteristic, thereby producing a graphite-based device with multiple functionalities in the same device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.